Dynavac - Space Simulation Chambers & Thin Film Systems
  1. Thin Film Deposition Systems
  3. Systems
  5. PVD Deposition Systems

Physical Vapor Deposition (PVD) Systems & Equipment

Dynavac delivers production-proven PVD systems designed for high uniformity, reliability, and long-term uptime. Every system is engineered for stable rates, dense films, and repeatable performance across demanding industrial and scientific applications.

High-performance, high-reliability batch PVD systems for thin film deposition

Dynavac PVD systems deposit metal and dielectric films—including aluminum, silver, chromium, ITO, SiO₂, TiO₂—on glass, metal, plastics, and flexible substrates.

Dynavac optimizes all aspects of the PVD system to ensure that deposited films are smooth, dense, and adherent. And after nearly 40 years in the business, we’re here to stay with customer service second to none.

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We support a full range of deposition processes— from sputtering through evaporation

We support a full range of PVD deposition processes—from magnetron sputtering to thermal and electron-beam evaporation—enabling precise and versatile thin-film fabrication across diverse materials and applications.

Every Dynavac thin-film system is engineered for superior performance, spanning small-batch and R&D platforms through large-area production systems designed for flat, curved, or multi-dimensional substrates. Each system is configured specifically for the application: deposition sources and power-supply technologies are selected to deliver optimal film smoothness, density, adhesion, and long-term process stability.

Sputtered filmsPVD sourcesIon sources
  • RF, AC, and DC power
  • Planar and rotary magnetron sources
  • Reactive processes for oxides, nitrides, etc.

Dynavac batch PVD applications include

  • Electronics and semiconductors
  • Barrier coatings
  • Wear coatings
  • Metallic coatings

Dynavac batch PVD system highlights

Deposition processesChamberPumping systemsSubstrate fixturesPre-deposition treatmentsLayer thickness controlControl systems
  • Magnetron cathode (DC, pulsed DC and RF)
  • High current thermal
  • Single and multi-pocket e-beam
  • End-hall ion source
  • RF ion source with hollow cathode neutralizer
  • RF, AC, and DC power
  • Planetary and rotary magnetron sources
  • Reactive processes for oxides, nitrides, etc.

Resources

A Solution That Streamlined Production and Increased Profitability

An industrial lighting company needed to increase throughput and profitability of their reflector production line to meet production demands. Their existing manufacturing method involved a three-step deposition process using individual work centers. With a 17-hour/batch production cycle, the method was inefficient and had very high operating costs.

Product Spotlight - Dynavac Confocal Sputtering System

We recently delivered a confocal sputtering system to a valued client. Check out these highlights.

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